Resonant interband tunneling through a 110 nm InAs quantum well
作者:
R. Beresford,
L. F. Luo,
K. F. Longenbach,
W. I. Wang,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 6
页码: 551-553
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102742
出版商: AIP
数据来源: AIP
摘要:
The mechanism of resonant interband tunneling in polytype heterostructures of GaSb/AlSb/InAs gives excellent peak‐to‐valley current ratios due to the band‐gap blocking of the nonresonant current components. Using InAs as the base in a double‐barrier polytype heterostructure, it is possible to demonstrate resonant tunneling at room temperature through a quantum well as wide as 110 nm. At this width, which is about 20 times larger than that typically used in resonant tunneling diodes in the GaAs/AlGaAs system, the peak‐to‐valley ratio is 44:1 (77 K). Significant negative differential resistance is observed even for 240 nm wells. The projected device response time for a resonant tunneling transistor with a wide InAs quantum base is more than five times faster than for a GaAs device, due to the reduced base resistance.
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