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Low‐frequency noise in silicon‐gate metal‐oxide‐silicon capacitors before oxide breakdown

 

作者: B. Neri,   P. Olivo,   B. Ricco`,  

 

期刊: Applied Physics Letters  (AIP Available online 1987)
卷期: Volume 51, issue 25  

页码: 2167-2169

 

ISSN:0003-6951

 

年代: 1987

 

DOI:10.1063/1.98930

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Measurements of the fluctuations in the tunneling currentItthrough a thin SiO2insulating layer, by means of an ultralow noise measurement set, showed that after a first time interval in which its power spectral density is stationary and proportional toI2t, an on‐off modulation ofItarises, just before oxide breakdown. This bistable noise seems to be related to localized phenomena controlled by trapping‐detrapping processes within the oxide. Two possible mechanisms which could give rise to this bistable noise are discussed.

 

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