Low‐frequency noise in silicon‐gate metal‐oxide‐silicon capacitors before oxide breakdown
作者:
B. Neri,
P. Olivo,
B. Ricco`,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 51,
issue 25
页码: 2167-2169
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.98930
出版商: AIP
数据来源: AIP
摘要:
Measurements of the fluctuations in the tunneling currentItthrough a thin SiO2insulating layer, by means of an ultralow noise measurement set, showed that after a first time interval in which its power spectral density is stationary and proportional toI2t, an on‐off modulation ofItarises, just before oxide breakdown. This bistable noise seems to be related to localized phenomena controlled by trapping‐detrapping processes within the oxide. Two possible mechanisms which could give rise to this bistable noise are discussed.
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