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Epitaxial growth of superconducting YBa2Cu3O7−xthin films by reactive magnetron sputtering

 

作者: G. C. Xiong,   S. Z. Wang,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 55, issue 9  

页码: 902-904

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.102450

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Perfect epitaxial growth of superconducting YBa2Cu3O7−xthin films have been achieved on (100) SrTiO3, (110) SrTiO3, and (100) ZrO2substrates using a modified planar dc magnetron sputtering system. The films exhibit zero resistances at 87–90 K with transition widths of about 2 K. The critical current density of 1.4×106A/cm2at 77 K so far has been measured on the (100) SrTiO3substrate. The epitaxial orientation of the thin films was influenced by the substrate orientation, the substrate temperature, and the oxygen partial pressure. The quality of growth and the epitaxial orientation of the films were examined by electron channeling, x‐ray diffraction, and reflection high‐energy electron diffraction techniques. The preferential epitaxial orientation is discussed.

 

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