首页   按字顺浏览 期刊浏览 卷期浏览 Advanced Control of ECR‐Source and Beamline System on High Voltage Potential
Advanced Control of ECR‐Source and Beamline System on High Voltage Potential

 

作者: J. Bundesmann,   R. Hellhammer,   V. Hoffmann,   N. Stolterfoht,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1903)
卷期: Volume 680, issue 1  

页码: 1030-1033

 

ISSN:0094-243X

 

年代: 1903

 

DOI:10.1063/1.1619884

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The ECRIS‐Facility at the Ionenstrahllabor ISL (ion beam laboratory) consists of a 14.5 GHz‐ECR‐source, a potential‐variable beamline system and four target areas. It is dedicated to produce ions from H to Xe with charge states from 1 ⩽ q ⩽ 27, in an ion energy range from ∼1 eV to ∼450 keV depending on the effective acceleration potential up to 17 kV. To enable a user‐friendly operation of the facility, especially for guest groups, the control system CODIAN was developed. The CODIAN‐system accesses and protocols all parameters in the various hardware set‐up, saving and restoring the complete settings of all beamline components. The flexibility of the software concept and the wide range of hardware implementations will be demonstrated. © 2003 American Institute of Physics

 

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