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Roughness in Nb/Cu multilayers determined by x‐ray diffraction and atomic force microscopy

 

作者: K. Temst,   M. J. Van Bael,   B. Wuyts,   C. Van Haesendonck,   Y. Bruynseraede,   D. G. de Groot,   N. Koeman,   R. Griessen,  

 

期刊: Applied Physics Letters  （AIP Available online 1995）
卷期: Volume 67, issue 23  

页码: 3429-3431

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115269

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Nb/Cu multilayers grown by molecular beam epitaxy have been studied by x‐ray diffraction and atomic force microscopy. X‐ray diffraction provides the average interface roughness while atomic force microscopy shows the roughness and topology of the upper surface. Comparison of both methods shows that high‐angle diffraction averages over a lateral length which is in good agreement with the typical grain size. ©1995 American Institute of Physics.

 

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