In situmonitoring of ion sputtering and thermal annealing of crystalline surfaces using an oblique-incidence optical reflectance difference method
作者:
X. D. Zhu,
E. Nabighian,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 19
页码: 2736-2738
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122574
出版商: AIP
数据来源: AIP
摘要:
We demonstrate that the morphology of crystalline surfaces during ion sputtering and thermal annealing can be monitoredin situwith an oblique-incidence polarization-modulated optical reflectance difference technique. Such a technique is effective under high ambient pressures as well as ultrahigh vacuum. We studied the Ne ion sputtering and thermal annealing of Ni(111) from 623 to 823 K. We found that the rate-limiting step (with an activation energy of 1.1 eV/atom) during annealing is most likely to be direct evaporation of Ni atoms from step edges. ©1998 American Institute of Physics.
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