Arsenic cap layer desorption and the formation of GaAs(001)c(4×4) surfaces
作者:
I. Karpov,
N. Venkateswaran,
G. Bratina,
W. Gladfelter,
A. Franciosi,
L. Sorba,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1995)
卷期:
Volume 13,
issue 5
页码: 2041-2048
ISSN:1071-1023
年代: 1995
DOI:10.1116/1.588130
出版商: American Vacuum Society
关键词: ARSENIC;DESORPTION;GALLIUM ARSENIDES;MOLECULAR BEAM EPITAXY;TEMPERATURE DEPENDENCE;GaAs;As
数据来源: AIP
摘要:
GaAs(001)c(4×4) surfaces were obtained in the 380–450 °C temperature range by thermal desorption of As cap layers from substrates prepared by molecular beam epitaxy. Although reflection high‐energy electron diffraction patterns showed little change in the temperature range explored,insituscanning tunneling microscopy and Auger spectroscopy, complemented byexsituatomic force microscopy, indicate that in the lower‐temperature range examined up to 11%–12% of the surface may still be occupied by adsorbed As in the form of wires and particles preferentially oriented along 〈100〉 directions.
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