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Arsenic cap layer desorption and the formation of GaAs(001)c(4×4) surfaces

 

作者: I. Karpov,   N. Venkateswaran,   G. Bratina,   W. Gladfelter,   A. Franciosi,   L. Sorba,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1995)
卷期: Volume 13, issue 5  

页码: 2041-2048

 

ISSN:1071-1023

 

年代: 1995

 

DOI:10.1116/1.588130

 

出版商: American Vacuum Society

 

关键词: ARSENIC;DESORPTION;GALLIUM ARSENIDES;MOLECULAR BEAM EPITAXY;TEMPERATURE DEPENDENCE;GaAs;As

 

数据来源: AIP

 

摘要:

GaAs(001)c(4×4) surfaces were obtained in the 380–450 °C temperature range by thermal desorption of As cap layers from substrates prepared by molecular beam epitaxy. Although reflection high‐energy electron diffraction patterns showed little change in the temperature range explored,insituscanning tunneling microscopy and Auger spectroscopy, complemented byexsituatomic force microscopy, indicate that in the lower‐temperature range examined up to 11%–12% of the surface may still be occupied by adsorbed As in the form of wires and particles preferentially oriented along 〈100〉 directions.

 

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