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Si &dgr;-layers embedded in GaAs

 

作者: P. O. Holtz,   B. Sernelius,   A. V. Buyanov,   G. Pozina,   H. H. Radamson,   L. D. Madsen,   J. P. McCaffrey,   B. Monemar,   J. Thordson,   T. G. Andersson,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 73, issue 25  

页码: 3709-3711

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.122871

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An ultrathin, 1–6 monolayers (MLs) thick, Si &dgr; layer, is embedded in bulk GaAs. The normally observed self-assembling with resulting phase separation can be avoided until &dgr;-layer thickness of 4 MLs, which opens the possibility to study two-dimensional (2D) properties of this III–V/IV heterostructure. Optical, electrical, transport, and structural characterization of the Si &dgr; layer has been carried out. In luminescence, two novel emission bands are observed, which are blueshifted as the width of the Si &dgr; layer is reduced, indicating pronounced 2D properties. The derived results on transition energies and electronic structure are compared with theoretical predictions obtained by a self-consistent approach. ©1998 American Institute of Physics.

 

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