Si &dgr;-layers embedded in GaAs
作者:
P. O. Holtz,
B. Sernelius,
A. V. Buyanov,
G. Pozina,
H. H. Radamson,
L. D. Madsen,
J. P. McCaffrey,
B. Monemar,
J. Thordson,
T. G. Andersson,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 25
页码: 3709-3711
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122871
出版商: AIP
数据来源: AIP
摘要:
An ultrathin, 1–6 monolayers (MLs) thick, Si &dgr; layer, is embedded in bulk GaAs. The normally observed self-assembling with resulting phase separation can be avoided until &dgr;-layer thickness of 4 MLs, which opens the possibility to study two-dimensional (2D) properties of this III–V/IV heterostructure. Optical, electrical, transport, and structural characterization of the Si &dgr; layer has been carried out. In luminescence, two novel emission bands are observed, which are blueshifted as the width of the Si &dgr; layer is reduced, indicating pronounced 2D properties. The derived results on transition energies and electronic structure are compared with theoretical predictions obtained by a self-consistent approach. ©1998 American Institute of Physics.
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