High level injection phenomena in P–N junctions
作者:
J. C. Manifacier,
R. Ardebili,
C. Popescu,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 80,
issue 5
页码: 2838-2846
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.363134
出版商: AIP
数据来源: AIP
摘要:
To model high injection phenomena in P–N junction devices it is usually necessary to use numerical analysis. This is because the standard procedure of dividing the structure into neutral zones and depletion layer (regional approximation) fails. In a recent paper, Yueetal. [J. Appl. Phys.77, 1611 (1995)] proposed an extension of the Shockley theory, retaining the form of the conventional diffusion current‐only model for the conduction mechanism. Their solution was based on the resolution of the ambipolar transport equation in the base. It is shown here by a numerical simulation of the complete structure, within the framework of the drift‐diffusion model, that both the exponential current dependence:J&agr; exp(eVa/2kT) as well as the Yueetal. approximation are valid only in the limiting case of a strongly extrinsic short base diode. ©1996 American Institute of Physics.
点击下载:
PDF
(200KB)
返 回