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Synchrotron radiation assisted deposition of carbon films

 

作者: Haruhiko Ohashi,   Katsushi Inoue,   Yoji Saito,   Akira Yoshida,   Hiroshi Ogawa,   Kosuke Shobatake,  

 

期刊: Applied Physics Letters  （AIP Available online 1989）
卷期: Volume 55, issue 16  

页码: 1644-1646

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.102225

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photochemical vapor deposition of carbon films fromn‐butane gas has been successfully done, for the first time, at room temperature using synchrotron radiation as a light source. The deposited films are hydrogenated amorphous carbon films withsp3bonds. The deposition rate increases with negative bias.

 

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