Insituburied GaInAs/InP quantum dot arrays by selective area metalorganic vapor phase epitaxy
作者:
Yvan D. Galeuchet,
Hugo Rothuizen,
Peter Roentgen,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 58,
issue 21
页码: 2423-2425
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.104891
出版商: AIP
数据来源: AIP
摘要:
Using metalorganic vapor phase epitaxy to grow GaInAs/InP layers on masked InP substrates patterned with submicron square holes, we have fabricatedinsituburied quantum dot arrays for the first time. Starting with mask openings ≥150 nm × 150 nm and utilizing the natural crystal habits to form low‐index plane facetted pyramids inside the holes, <m1;&40q>highly regular GaInAs quantum dots embedded in InP are obtained in a single growth step. <m1;&40q>As verified by cathodoluminescence, the dots exhibit very high luminescence efficiencies, even at room temperature, owing to the absence of air‐exposed or etch‐damaged heterointerfaces.
点击下载:
PDF
(503KB)
返 回