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Electron beam induced metalization of palladium acetate

 

作者: T. J. Stark,   T. M. Mayer,   D. P. Griffis,   P. E. Russell,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1991）
卷期: Volume 9, issue 6  

页码: 3475-3478

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585826

 

出版商: American Vacuum Society

 

关键词: ELECTRON BEAMS;KEV RANGE 01−10;PALLADIUM;PALLADIUM COMPOUNDS;ACETATES;THIN FILMS;ENERGY BEAM DEPOSITION;SPATIAL RESOLUTION;METALLIZATION;Pd

 

数据来源: AIP

 

摘要:

Films of palladium acetate Pd(OOCH3)20.1 and 0.3 μm thick have been stoichiometrically altered through exposure to electron beams of 1–30 keV. The lowest required doses for alteration, 1000 and 2500 μC/cm2, were obtained using beam energies of 4 and 5 keV, respectively. These results have been related to Monte Carlo simulations of energy absorbed within a thin surface film. The minimum line widths of features produced was less than 100 nanometers with estimated Pd/C ratio of 1 and measured resistivities as low as 100 μΩ cm.

 

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