Aberration calculation for combined magnetic focusing deflection systems with curved axes
作者:
Jiye Ximen,
Zhixiong Liu,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 73,
issue 4
页码: 1570-1575
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.353237
出版商: AIP
数据来源: AIP
摘要:
The general aberration theory for combined electromagnetic focusing‐deflection systems with curved axes will be applied to a scanning electron microscopic system and an electron lithographic system. All third order geometric and first order chromatic aberrations have been calculated along rectilinear/curvilinear axes. The important identities between some aberration coefficients will be verified numerically. The geometric and chromatic aberrations calculated along the matching curvilinear axis will be compared with those along the rectilinear axis. The computational trials may be of help for explaining the mechanism of moving/swinging objective lens and variable axis lens systems.
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