Relationship of background carrier concentration and defects in GaN grown by metalorganic vapor phase epitaxy
作者:
G. Y. Zhang,
Y. Z. Tong,
Z. J. Yang,
S. X. Jin,
J. Li,
Z. Z. Gan,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 23
页码: 3376-3378
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120341
出版商: AIP
数据来源: AIP
摘要:
Experimental results show that the background carrier concentrations in GaN films grown by metalorganic vapor phase epitaxy are related to defects. A thermal equilibrium method was used to calculate the background carrier concentration related to intrinsic defects in an ideal GaN crystal. The results show that the N vacancy concentration does not exceed2×1017 cm−3in GaN grown at temperatures ranging from 800 to 1500 K. It can be concluded that the N vacancy is one of the major sources of carriers when the carrier concentrationn<2×1017 cm−3,but the main sources should be other defects whenn>2×1017 cm−3;this conclusion may lead to ways for further improving the quality of GaN films. ©1997 American Institute of Physics.
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