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Relationship of background carrier concentration and defects in GaN grown by metalorganic vapor phase epitaxy

 

作者: G. Y. Zhang,   Y. Z. Tong,   Z. J. Yang,   S. X. Jin,   J. Li,   Z. Z. Gan,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 23  

页码: 3376-3378

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120341

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Experimental results show that the background carrier concentrations in GaN films grown by metalorganic vapor phase epitaxy are related to defects. A thermal equilibrium method was used to calculate the background carrier concentration related to intrinsic defects in an ideal GaN crystal. The results show that the N vacancy concentration does not exceed2×1017 cm−3in GaN grown at temperatures ranging from 800 to 1500 K. It can be concluded that the N vacancy is one of the major sources of carriers when the carrier concentrationn<2×1017 cm−3,but the main sources should be other defects whenn>2×1017 cm−3;this conclusion may lead to ways for further improving the quality of GaN films. ©1997 American Institute of Physics.

 

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