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A system forinsitustudies of plasma–surface interactions using x‐ray photoelectron spectroscopy

 

作者: J. L. Vossen,   J. H. Thomas,   J.‐S. Maa,   O. R. Mesker,   G. O. Fowler,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1983）
卷期: Volume 1, issue 3  

页码: 1452-1455

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572039

 

出版商: American Vacuum Society

 

关键词: x radiation;photoelectron spectroscopy;fabrication;uses;surfaces;plasma guns;etching;substrates;chemical reactions;interactions;plasma beam injection

 

数据来源: AIP

 

摘要:

A system is described in which plasma/surface treatments can be performed and the substrates can be analyzed by x‐ray photoelectron spectroscopy by transferring them via a load lock into the analytic chamber. Also described are some plasma etching experiments that demonstrate the utility of this apparatus. The system emulates larger systems in which plasma treatments are performed at pressures, voltages, and power densities similar to those employed in large commercial systems.

 

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