Metal organic vapor phase epitaxy growth of GaAsN on GaAs using dimethylhydrazine and tertiarybutylarsine
作者:
A. Ougazzaden,
Y. Le Bellego,
E. V. K. Rao,
M. Juhel,
L. Leprince,
G. Patriarche,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 21
页码: 2861-2863
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119025
出版商: AIP
数据来源: AIP
摘要:
GaAsN layers with good structural quality and surface morphology have been successfully grown on a GaAs substrate using atmospheric pressure metal organic vapor phase epitaxy. A new combination of precursors namely, dimethylhydrazine for nitrogen and tertiarybutylarsine instead of conventional arsine for arsenic, greatly facilitated growths at temperatures as low as 500 °C. Layers with N content as high as 3&percent; and corresponding to room temperature photoluminescence (PL) peak wavelength of 1.17 &mgr;m (1.064 eV) have been obtained. ©1997 American Institute of Physics.
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