Anomalous carrier tail generation mechanism in BF+2ion‐implanted layers of silicon
作者:
Yasuo Wada,
Norikazu Hashimoto,
期刊:
Journal of Applied Physics
(AIP Available online 1979)
卷期:
Volume 50,
issue 10
页码: 6257-6261
ISSN:0021-8979
年代: 1979
DOI:10.1063/1.325763
出版商: AIP
数据来源: AIP
摘要:
Anomalous carrier tail generation in BF+2ion‐implanted layers through gas‐ion interaction is quantitatively examined by a combination of gas pressure measurements and carrier profile measurements. The collision cross sections of He, Ar, Kr, and N2gases with BF+2ions are derived from the relative peak carrier concentrations of the tail and residual gas pressure relationships. Below 10−2Pa, simple gas‐ion interaction occurs and the collision cross section is around 10−14cm−2. A gas pressure of less than 10−5Pa in the implanter ion path is necessary to almost completely eliminate the anomalous tail generation. On the other hand, more than 4×10−1Pa, multiple collisions between the ions and the residual gas atoms/moleculs occur and the tail carrier concentration become saturated. BF3gas molecules are also foud to generate B+ions through collisions with BF+2ions.
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