Dislocation dynamics during the growth of silicon ribbon
作者:
O. W. Dillon,
C. T. Tsai,
R. J. De Angelis,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 60,
issue 5
页码: 1784-1792
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337221
出版商: AIP
数据来源: AIP
摘要:
The thermal viscoplastic stresses and the dislocation densities in silicon ribbon are computed for an axially changing thermal profile by using an iterative finite difference method. A material constitutive equation (Haasen–Sumino model) which involves an internal variable (mobile dislocation density) is used. The results are interpreted as showing that there is a maximum width of silicon ribbon that can be grown when viscoplasticity and dislocations are considered. This maximum width limitation does not exist if the material behavior is elastic.
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