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Dislocation dynamics during the growth of silicon ribbon

 

作者: O. W. Dillon,   C. T. Tsai,   R. J. De Angelis,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 5  

页码: 1784-1792

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337221

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The thermal viscoplastic stresses and the dislocation densities in silicon ribbon are computed for an axially changing thermal profile by using an iterative finite difference method. A material constitutive equation (Haasen–Sumino model) which involves an internal variable (mobile dislocation density) is used. The results are interpreted as showing that there is a maximum width of silicon ribbon that can be grown when viscoplasticity and dislocations are considered. This maximum width limitation does not exist if the material behavior is elastic.

 

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