A comparison of boron and phosphorus diffusion and dislocation loop growth from silicon implants into silicon
作者:
Jingwei Xu,
V. Krishnamoorthy,
Kevin S. Jones,
Mark E. Law,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 1
页码: 107-111
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.363994
出版商: AIP
数据来源: AIP
摘要:
Transient enhanced diffusion (TED) results from implantation damage creating enhanced diffusion of dopants in silicon. This phenomenon has mostly been studied using boron marker layers. We have performed an experiment using boron, phosphorus, and dislocation markers to compare TED effects. This experiment shows that phosphorus is enhanced significantly more than boron during damage annealing. Dislocation growth indicates that a number of interstitials greater than the damage dose is captured during these anneals. The time to saturate the dislocation growth agrees well with phosphorus diffusion saturation, and is greater than the boron saturation. ©1997 American Institute of Physics.
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