Reproducible leaky tube diffusion of Cd in InP at 500 °C
作者:
C. B. Wheeler,
R. J. Roedel,
Randall W. Nelson,
Stephan N. Schauer,
Peter Williams,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 68,
issue 3
页码: 969-972
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.346662
出版商: AIP
数据来源: AIP
摘要:
We report for the first time the successful application of the leaky tube method to diffuse elemental Cd into InP at 500 °C. Specular surfaces are consistently realized while additional phosphorus in the ambient is not required. Free‐carrier concentration profiles and junction depths were experimentally determined for times ranging from 20 min to 21/2 h. A reproducible surface concentration of ionized acceptors is ∼1×1018cm−3(T=300 K). A concentration dependent diffusion coefficient ranging from approximately 1×10−14to 1×10−10cm2/s is calculated for the conditions under investigation. Secondary ion mass spectroscopy analysis shows the atomic Cd concentration to be very similar to that of the ionized acceptors, with the atomic surface concentration approximately two times greater than the surface hole concentration.
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