首页   按字顺浏览 期刊浏览 卷期浏览 Densification and Microstructural Development of Silicon Nitride–Silica During Hot Isos...
Densification and Microstructural Development of Silicon Nitride–Silica During Hot Isostatic Pressing

 

作者: Jianren Zeng,   Isao Tanaka,   Yoshinari Miyamoto,   Osamu Yamada,   Koichi Niihara,  

 

期刊: Journal of the American Ceramic Society  （WILEY Available online 1992）
卷期: Volume 75, issue 1  

页码: 148-152

 

ISSN:0002-7820

 

年代: 1992

 

DOI:10.1111/j.1151-2916.1992.tb05457.x

 

出版商: Blackwell Publishing Ltd

 

关键词: silicon nitride;silica;hot isostatic pressing;sintering;modeling

 

数据来源: WILEY

 

摘要:

The influence of SiO2addition on the densification and microstructural development of high‐purity Si3N4during hot isostatic pressing (HIP) was studied. During HIP, densification was promoted, but the phase transformation fromα‐Si3N4toβ‐Si3N4was impeded by SiO2. Analysis using a simple model shows that the enhanced densification was mainly due to the viscous flow of SiO2. The microstructure changed remarkably at between 10 and 20 wt% SiO2additions. Analysis of the phase transformation kinetics suggests that the diffusion of Si3N4through SiO2glass is the ratecontrolling step for the transfo

 

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