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Thermal conductivity of Si–Ge superlattices

 

作者: S.-M. Lee,   David G. Cahill,   Rama Venkatasubramanian,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 22  

页码: 2957-2959

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118755

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The thermal conductivity of Si–Ge superlattices with superlattice periods30<L<300Å, and aSi0.85Ge0.15thin film alloy is measured using the 3&ohgr;method. The alloy film shows a conductivity comparable to bulk SiGe alloys while the superlattice samples have a thermal conductivity that is smaller than the alloy. For30<L<70Å, the thermal conductivity decreases with decreasingL; these data provide a lower limit to the interface thermal conductanceGof epitaxial Si–Ge interfaces:G> 2 × 109 W m−2 K−1at 200 K. Superlattices with relatively longer periods,L>130Å, have smaller thermal conductivities than the short-period samples. This unexpected result is attributed to a strong disruption of the lattice vibrations by extended defects produced during lattice-mismatched growth. ©1997 American Institute of Physics.

 

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