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Thin film relaxation in cross‐sectional transmission electron microscopy specimens of GexSi1−x/Si strained‐layer superlattices

 

作者: X. F. Duan,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 17  

页码: 2247-2249

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113181

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A large‐angle convergent‐beam electron diffraction (LACBED) pattern with fine diffraction lines from a cross‐sectional specimen of GexSi1−x/Si strained‐layer superlattices (SLS) can give much information on local strain and misfit stress relaxation. The shift of the diffraction lines in the GeSi layers from those in the Si layers can be used to determine the strain relaxation. A profile of the thin film relaxation versus the specimen thickness is presented. ©1995 American Institute of Physics.

 

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