作者: X. F. Duan,
期刊: Applied Physics Letters (AIP Available online 1995) 卷期: Volume 66, issue 17
页码: 2247-2249
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113181
出版商: AIP
数据来源: AIP
摘要:
A large‐angle convergent‐beam electron diffraction (LACBED) pattern with fine diffraction lines from a cross‐sectional specimen of GexSi1−x/Si strained‐layer superlattices (SLS) can give much information on local strain and misfit stress relaxation. The shift of the diffraction lines in the GeSi layers from those in the Si layers can be used to determine the strain relaxation. A profile of the thin film relaxation versus the specimen thickness is presented. ©1995 American Institute of Physics.
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