Evaluation of heterodyne alignment technique for x‐ray steppers
作者:
K. Koga,
I. Higashikawa,
T. Itoh,
K. Araki,
K. Fujita,
J. Yasui,
S. Aoki,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1992)
卷期:
Volume 10,
issue 6
页码: 3248-3251
ISSN:1071-1023
年代: 1992
DOI:10.1116/1.585923
出版商: American Vacuum Society
关键词: LITHOGRAPHY;ALIGNMENT;X−RAY EQUIPMENT;SPATIAL RESOLUTION;MASKING;HETERODYNE RECEIVERS
数据来源: AIP
摘要:
Registration accuracy, as well as resolution capability, is one of the critical factors to identify an appropriate lithography tool. For deep submicron devices represented by the 256 Mbit dynamic random access memory, an alignment accuracy of better than 30 nm is needed. In this article, the alignment accuracy of an x‐ray stepper was evaluated using the double‐exposure method with a posiresist. The alignment accuracy obtained was better than 38 nm (3σ). Moreover, making a quantitative analysis of alignment error factors, we identified the possibility of improvement toward better than 30 nm (3σ).
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