Period expansion of Co/C and CoN/CN soft x-ray multilayers after annealing
作者:
H. L. Bai,
E. Y. Jiang,
C. D. Wang,
R. Y. Tian,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 5
页码: 2270-2276
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366033
出版商: AIP
数据来源: AIP
摘要:
Period expansion of Co/C and CoN/CN soft x-ray multilayers has been investigated by x-ray diffraction and Raman spectroscopy. Below the anneal temperature of 400 °C, the period expansion (< 12&percent;) of Co/C multilayers is mainly caused by the graphitization of the amorphous carbon layers. By 500 °C, the crystallization and agglomeration of Co layers induce an enormous period expansion (∼40&percent;). The period expansion of CoN/CN multilayers is only 4&percent; at 400 °C, which is much smaller than that of Co/C multilayers. The interface patterns of the CoN/CN multilayers still exist even if they were annealed at 700 °C. The Raman spectroscopy analyses indicate that the formation of thesp3bonding can be suppressed effectively by doping N atoms, and thus the period expansion is decreased considerably at annealing temperatures below 600 °C. The significant suppression of grain growth above 600 °C is believed to be attributed to the coexistence of hcp and fcc Co structures induced by interstitial N atoms, which cause the high-temperature period expansion decrease. The results also imply that the structural stability of Co/C soft x-ray multilayers can be significantly improved through doping N atoms.©1997 American Institute of Physics.
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