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Correlation between critical temperature and other electrical properties for thin tantalum films

 

作者: R. M. Aguado Bombin,   W. E. J. Neal,  

 

期刊: Applied Physics Letters  （AIP Available online 1976）
卷期: Volume 28, issue 7  

页码: 410-410

 

ISSN:0003-6951

 

年代: 1976

 

DOI:10.1063/1.88779

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Measurements on thin tantalum films prepared by evaporation in ultrahigh vacuum show definite correlation between the critical temperature (Tc) and resistivity ratio (&rgr;300/&rgr;10). Empirical relationships are given for films having resistivity ratios in the range 1.2–6 corresponding to a thickness range 11⋅5–965 nm.

 

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