Development of an optical emission spectroscopy‐based method for dynamic compositional analysis of sputter deposited films from multicomponent targets
作者:
K. D. Leedy,
J. M. Rigsbee,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 6
页码: 676-678
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114096
出版商: AIP
数据来源: AIP
摘要:
A method of calculating as‐deposited elemental film composition during the actual deposition process was developed using optical emission spectroscopy of the glow discharge. These results are demonstrated by analyses of a series of thin film Ag1−xSixalloys fabricated using radio frequency sputter deposition with composite Ag+Si sputter targets. Using intensity ratios of the Si (251.6 nm), Ag (328.1 nm), and Ar (419.8 nm) emission lines after equilibration of the substrate temperature, estimates of at. % Si in the films were calculated which agreed well with post‐deposition composition measurements of the films by Auger electron spectroscopy. ©1995 American Institute of Physics.
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