Interface structures in beta‐silicon carbide thin films
作者:
Steven R. Nutt,
David J. Smith,
H. J. Kim,
Robert F. Davis,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 4
页码: 203-205
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97661
出版商: AIP
数据来源: AIP
摘要:
Interface structures in monocrystalline beta‐silicon carbide thin films grown on (001) silicon substrates have been studied by high‐resolution electron microscopy of cross‐sectional specimens. Despite a large lattice mismatch, there is a periodic registry of {111} atom planes across the SiC‐Si interface. Planar defects on SiC {111} planes are grown‐in and arise primarily from lattice and thermal expansion mismatch. Thermal oxidation in wet atmospheres results in preferential attack of the SiC film at sites where planar defects intersect the film surface, whereas oxidation in dry atmospheres does not.
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