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Regular step arrays on silicon

 

作者: J. Viernow,   J.-L. Lin,   D. Y. Petrovykh,   F. M. Leibsle,   F. K. Men,   F. J. Himpsel,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 72, issue 8  

页码: 948-950

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.120882

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Highly regular arrays of steps are produced on vicinal Si(111)7×7. The step edges are atomically straight for up to2×104lattice sites. The terraces are single domain, which produces a minimum kink width of 2.3 nm (half a 7×7 unit cell) and thus a high barrier for creating kinks. Criteria for obtaining optimum step arrays are established, such as the miscut [≈1° towards (1¯1¯2)] and an annealing sequence which passes through step bunching regions quickly. ©1998 American Institute of Physics.

 

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