Photoluminescence study of nitrogen implanted silicon
作者:
H. Ch. Alt,
L. Tapfer,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 45,
issue 4
页码: 426-428
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.95245
出版商: AIP
数据来源: AIP
摘要:
Silicon crystals are implanted with nitrogen in the dose range of 1010–1016ions/cm2. After thermal annealing at 700 °C photoluminescence at 1.1223 eV (Aline) is observed which was reported previously only from bulk doped crystals. The dependence on the implantation dose and the annealing behavior of the recombination center are investigated in detail. We find that electrically active nitrogen is not responsible for the formation of the defect whereas there exists a correlation with vacancy‐interstitial nitrogen complexes.
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