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Reaction of fluorine atoms with SiO2

 

作者: D. L. Flamm,   C. J. Mogab,   E. R. Sklaver,  

 

期刊: Journal of Applied Physics  （AIP Available online 1979）
卷期: Volume 50, issue 10  

页码: 6211-6213

 

ISSN:0021-8979

 

年代: 1979

 

DOI:10.1063/1.325755

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The heterogeneous reaction of F atoms with SiO2(thermal oxide) has been measured using a discharge‐flow tube technique. The reaction probability for F atoms is &egr;F= (1.63±0.15) ×10−2 exp(−0.163 eV/kT) for 250<T<365 K.

 

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