Ion implantation :A new method of doping semiconductors–I
作者:
L.N. Large,
期刊:
Contemporary Physics
(Taylor Available online 1969)
卷期:
Volume 10,
issue 3
页码: 277-298
ISSN:0010-7514
年代: 1969
DOI:10.1080/00107516908224597
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
A novel method for doping semiconductors is ion implantation where impurities are injected in the form of high-energy ions. The range of these ions is well defined and is a function of ion energy and mass, the nature of the crystel and its orientation to the beam. In addition to its application to semiconductor device manufacture, ion implantation involves a good deal of interesting physics over a wide field, and in order to include the important aspect the article hes been divided into two parts.
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