A modified plasma source for controlled layer thickness synthesis in laser pulse vapour deposition (LPVD)
作者:
R. Dietsch,
H. Mai,
W. Pompe,
S. Völlmar,
期刊:
Advanced Materials for Optics and Electronics
(WILEY Available online 1993)
卷期:
Volume 2,
issue 1‐2
页码: 19-29
ISSN:1057-9257
年代: 1993
DOI:10.1002/amo.860020104
出版商: John Wiley&Sons Ltd.
关键词: Thin films;Laser ablation;X‐ray mirrors;Plasma sources;UHV deposition equipment;Ni/C multilayer structures;SNMS depth profiling;TEM cross‐section
数据来源: WILEY
摘要:
AbstractThe conventional thin film deposition equipment of LPVD has been modified for the preparation of nanometre‐layer stacks of uniform thickness at reduced target/substrate separation. Therefore the planar target was replaced by a cylindrical one and the target motion regime has been modified.During thin film deposition a substrate translation is preferred instead of the usual rotation technique. With this arrangement the emission characteristic of the plasma source can be computer controlled and tailored via a stepper‐motor‐driven manipulator for the desired layer thickness profile across an extended substrate. Thus, for example, a homogeneous film thickness is obtained even for lower target/substrate distances, and an appropriate deposition rate can be maintained.First applications of the equipment are explained and compared with typical results of the conventional tech
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