Ex situhydrogen passivation effect of visiblep-i-ntype thin-film light-emitting diode characteristics
作者:
Jong-Wook Lee,
Koeng Su Lim,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 5
页码: 2432-2436
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.364283
出版商: AIP
数据来源: AIP
摘要:
The effect ofex situhydrogen passivation process on the performance of visible hydrogenated amorphous silicon carbide (a-SiC:H)-basedp-i-ntype thin-film light-emitting diodes has been investigated. Anex situhydrogen passivation process dramatically improved the device performance; that is, the threshold voltage decreased by about 5 V, the electroluminescence (EL) intensity increased by a factor of about 3, and the EL peak shifted toward a short wavelength from 700 to 600 nm, resulting in an increase of the brightness from 1 cd/m2to 35 cd/m2. This improvement of device performance is caused by the passivation of interface states in thep/iandi/ninterfaces as well as midgap states in the luminescent active intrinsica-SiC:H layer by hydrogen atoms. A process time dependence of theex situhydrogen passivation effect on the device performance also has been studied. ©1997 American Institute of Physics.
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