Cost estimates for commercial plasma source ion implantation
作者:
Donald J. Rej,
Ralph B. Alexander,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1994)
卷期:
Volume 12,
issue 4
页码: 2380-2387
ISSN:1071-1023
年代: 1994
DOI:10.1116/1.587768
出版商: American Vacuum Society
关键词: PLASMA;ION IMPLANTATION;COST ESTIMATION;AMORTIZATION;OPERATING COST;SURFACE AREA;EFFICIENCY
数据来源: AIP
摘要:
A semiempirical model for the cost of a commercial plasma source ion implantation (PSII) facility is presented. Amortized capital and operating expenses are estimated as functions of the surface area throughputT. The impact of secondary electron emission and batch processing time is considered. Treatment costs are found to decrease monotonically withTuntil they saturate at largeTwhen capital equipment payback and space rental dominate the expense. A reasonably sized PSII treatment facility should be able to treat a surface area of 104m2per year at a cost of $0.01 per cm2.
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