Enhanced surface/interface recombination and surface inversion of Ni decorated Si/Si(Ge)/Si heterostructures
作者:
T. Q. Zhou,
A. Buczkowski,
Z. J. Radzimski,
G. A. Rozgonyi,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 73,
issue 12
页码: 8412-8418
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.353410
出版商: AIP
数据来源: AIP
摘要:
Electron beam induced current variations in images of strain relaxed epitaxial Si/Si(Ge)/Si wafers deliberately contaminated with nickel from the backside are reported for different contamination levels. Strong recombination contrast due to NiSi2precipitates was observed both at the top Si surface and along buried interfacial misfit dislocations. A surface conductivity inversion fromntoptype was obtained for the high level Ni contaminated sample. A theoretical analysis based on the presence of a surface potential due either to a metal‐silicon Schottky contact, or to the accumulation of charged traps is used to explain the observed effects.
点击下载:
PDF
(1023KB)
返 回