Reactions of Silicon Carbide and Silicon(IV) Oxide at Elevated Temperatures
作者:
Nathan S. Jacobson,
Kang N. Lee,
Dennis S. Fox,
期刊:
Journal of the American Ceramic Society
(WILEY Available online 1992)
卷期:
Volume 75,
issue 6
页码: 1603-1611
ISSN:0002-7820
年代: 1992
DOI:10.1111/j.1151-2916.1992.tb04232.x
出版商: Blackwell Publishing Ltd
关键词: silicon carbide;silica;reactions;high temperature;Knudsen study
数据来源: WILEY
摘要:
The reaction between SiC and SiO2has been studied in the temperature range 1400–1600 K. A Knudsen cell in conjunction with a vacuum microbalance and a high‐temperature mass spectrometer was used for this study. Two systems were studied—1:1 SiC (2 wt% excess carbon) and SiO2; and 1:1:1 SiC, carbon, and SiO2. In both cases the excess carbon forms additional SiC within the Knudsen cell and adjusts to the direct reaction of stoichiometric SiC and SiO2to form SiO(g) and CO(g) in approximately a 3:1 ratio. These results are interpreted in terms of the SiC‐O stability
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