The effect of 3.5 keV electron irradiation on adhesion and contact resistivity of the Ag/YBa2Cu3O7interface has been studied using an evaporated silver layer onc‐axis oriented superconducting YBa2Cu3O7thin films. Electron doses ranged between 1016and 1018electrons/cm2. TheQ‐tip method of adhesion testing showed that even at the lowest electron dose adhesion is significantly improved. The contact resistivity of the interface was measured using a cross‐junction four‐point probe. Contact resistivity was unchanged at the lowest electron dose but increased as the electron dose increased. A theoretical model involving an electron irradiation damaged layer at the interface has been developed to explain measured contact resistivity changes. ©1995 American Institute of Physics.