Oxidation of ordered and disordered GaAs(110)
作者:
P. W. Chye,
C. Y. Su,
I. Lindau,
Perry Skeath,
W. E. Spicer,
期刊:
Journal of Vacuum Science and Technology
(AIP Available online 1979)
卷期:
Volume 16,
issue 5
页码: 1191-1194
ISSN:0022-5355
年代: 1979
DOI:10.1116/1.570188
出版商: American Vacuum Society
关键词: GALLIUM ARSENIDES;SURFACES;OXYGEN;ADSORPTION;PHOTOEMISSION;CHEMICAL SHIFTS;D STATES;ARSENIC;GALLIUM;ULTRAHIGH VACUUM;CHEMICAL BINDS
数据来源: AIP
摘要:
The adsorption of nonexcited molecular oxygen on ordered and disordered(110) surfaces of GaAs was studied using photoemission techniques. On the ordered surface, only one chemically shifted level was observed for the As3dcore level up to 1013exposure. The Ga3dcore level exhibits an asymmetrical broadening towards higher binding energy for the same exposure, indicating the presence of a shifted component. The percentages of shifted Ga and shifted As appear to be about equal. However, when a sputtered (disordered) surface was exposed to oxygen, there was preferential adsorption on the Ga. Implications of these data are discussed.
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