&lgr;≊1.5 &mgr;m InGaAsP ridge lasers grown by gas source molecular beam epitaxy
作者:
H. Temkin,
M. B. Panish,
R. A. Logan,
J. P. van der Ziel,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 45,
issue 4
页码: 330-332
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.95258
出版商: AIP
数据来源: AIP
摘要:
Separate confinement heterostructure wafers grown by gas source molecular beam epitaxy have been used to prepare ridge waveguide lasers operating up to 50 °C. Laser threshold currents varied from 45 to 65 mA at room temperature and output powers up to 9 mW have been obtained with the external quantum efficiency of ∼36%. Gain profile measurements indicate excellent material uniformity. Frequency response flat to at least 2 GHz is consistent with the material free of interfacial traps or any capacitive shunt paths.
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