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Substrate‐Condensate Chemical Interaction and the Vapor Deposition of Epitaxial Niobium Films

 

作者: T. E. Hutchinson,   K. H. Olsen,  

 

期刊: Journal of Applied Physics  (AIP Available online 1967)
卷期: Volume 38, issue 13  

页码: 4933-4937

 

ISSN:0021-8979

 

年代: 1967

 

DOI:10.1063/1.1709258

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Investigation of films formed by vacuum deposition of Nb on single‐crystal MgO has demonstrated the importance of chemical interaction between the substrate and overgrowth in the epitaxial growth process. The interaction layer is composed of an oxygen‐stabilized face‐centered cubic modification of the normally bcc Nb, or the compund NbO, the thickness of which is controlled by the oxygen diffusion process in the layer. The previously observed nucleation‐coalescence process of thin film formation is replaced by ordered chemical reaction. Defect‐producing misorientations between nuclei, predominant in the nucleation‐coalescence case, are not present in the ordered chemical reaction process. Thin films may thus be produced having defect density no higher than that of the substrate crystal. The effect of interaction between the substrate and condensate, although large in the example presented, should not be overlooked in other considerations of the epitaxial process where chemical reaction cannot be ruled out.

 

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