Photocontrolled double‐barrier resonant‐tunneling diode
作者:
H. S. Li,
Y. W. Chen,
K. L. Wang,
D. S. Pan,
L. P. Chen,
J. M. Liu,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1994)
卷期:
Volume 12,
issue 2
页码: 1269-1272
ISSN:1071-1023
年代: 1994
DOI:10.1116/1.587019
出版商: American Vacuum Society
关键词: TUNNEL DIODES;TERNARY COMPOUNDS;INDIUM ARSENIDES;GALLIUM ARSENIDES;ALUMINIUM ARSENIDES;DEPLETION LAYERS;PHOTOCURRENTS;QUANTUM EFFICIENCY;IV CHARACTERISTIC;MOLECULAR BEAM EPITAXY;SILICON ADDITIONS;(In,Ga)As:Si;AlAs;InP
数据来源: AIP
摘要:
A photocontrolled InGaAs/AlAs double‐barrier resonant‐tunneling diode, for the first time, has been demonstrated. The photoinduced valley current in the resonant‐tunneling diode was optically controlled by varying the incident optical power level. With the incident optical power intense enough, the photogenerated valley current became dominant over the peak current. As a consequence, the negative differential resistance of the device was nullified. A photogeneration process, based on photogenerating carriers in the depletion region adjacent to the double barriers, is described and characterized. The device under illumination was modeled as a resonant‐tunneling diode in series integration with a photodetector. The quantum efficiency for the photogeneration was measured and found comparable with theoretical prediction. The demonstrated photocontrolled double‐barrier resonant‐tunneling diode can be useful in a variety of applications.
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