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Photocontrolled double‐barrier resonant‐tunneling diode

 

作者: H. S. Li,   Y. W. Chen,   K. L. Wang,   D. S. Pan,   L. P. Chen,   J. M. Liu,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1994)
卷期: Volume 12, issue 2  

页码: 1269-1272

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587019

 

出版商: American Vacuum Society

 

关键词: TUNNEL DIODES;TERNARY COMPOUNDS;INDIUM ARSENIDES;GALLIUM ARSENIDES;ALUMINIUM ARSENIDES;DEPLETION LAYERS;PHOTOCURRENTS;QUANTUM EFFICIENCY;IV CHARACTERISTIC;MOLECULAR BEAM EPITAXY;SILICON ADDITIONS;(In,Ga)As:Si;AlAs;InP

 

数据来源: AIP

 

摘要:

A photocontrolled InGaAs/AlAs double‐barrier resonant‐tunneling diode, for the first time, has been demonstrated. The photoinduced valley current in the resonant‐tunneling diode was optically controlled by varying the incident optical power level. With the incident optical power intense enough, the photogenerated valley current became dominant over the peak current. As a consequence, the negative differential resistance of the device was nullified. A photogeneration process, based on photogenerating carriers in the depletion region adjacent to the double barriers, is described and characterized. The device under illumination was modeled as a resonant‐tunneling diode in series integration with a photodetector. The quantum efficiency for the photogeneration was measured and found comparable with theoretical prediction. The demonstrated photocontrolled double‐barrier resonant‐tunneling diode can be useful in a variety of applications.

 

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