Growth kinetics of amorphous interlayers and formation of crystalline silicide phases in ultrahigh vacuum deposited polycrystalline Er and Tb thin films on (001)Si
作者:
C. H. Luo,
L. J. Chen,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 8
页码: 3808-3814
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.365743
出版商: AIP
数据来源: AIP
摘要:
The growth kinetics of amorphous interlayer (a-interlayer) and formation of crystalline silicide phases in ultrahigh vacuum deposited polycrystalline Er and Tb thin films on (001)Si have been investigated by cross-section transmission electron microscopy. The growth of the amorphous interlayer in both Er/Si and Tb/Si systems was observed to exhibit similar behaviors. The growth was found to follow a linear growth law initially in samples annealed at 190–240 °C. The activation energy of the linear growth and maximum thickness of the a-interlayer were measured to be 0.5 eV, 15.5 nm, and 0.35 eV, 16 nm in Er/Si and Tb/Si systems, respectively. Crystalline silicides (ErSi2−xorTbSi2−x) were found to form at the amorphous interlayer/Si interfaces in samples after prolonged and/or high-temperature annealing. Simultaneous growth of the a-interlayer and crystalline phase was observed and the growth rate of a-interlayer was faster than the growth of epitaxialErSi2−xandTbSi2−xphases in samples annealed at 270–300 °C in Er/Si and Tb/Si systems, respectively. The competitive growth can be understood from energetic consideration. A high density of recessed amorphous regions were found to form between isolated epitaxial silicide regions which led to uneven silicide/Si interfaces and eventually pinholes in the silicide films at high temperatures. The formation mechanism of rough silicide/Si interface is discussed. ©1997 American Institute of Physics.
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