Deceleration ion optical system for sputtering measurements between 50 and 500 eV as function of angle of incidence
作者:
H. Liebl,
J. Bohdansky,
J. Roth,
V. Dose,
期刊:
Review of Scientific Instruments
(AIP Available online 1987)
卷期:
Volume 58,
issue 10
页码: 1830-1832
ISSN:0034-6748
年代: 1987
DOI:10.1063/1.1139527
出版商: AIP
数据来源: AIP
摘要:
A deceleration system for a parallel ion beam in the energy range of 50 to 500 eV is described. The system is used for sputtering yield measurements as a function of the angle of ion incidence. Measured yield data for Cu and Au sputtered by 100‐ and 300‐eV D+ions are reported and compared to computer calculations. Experimental and calculated data show only a weak dependence on the angle of incidence. However, at glancing incidence the experimental values are larger up to a factor of 2 compared to the calculated ones. This is attributed to the surface roughness not included in the calculations.
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