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Hole conduction in Si3N4films on Si

 

作者: Z. A. Weinberg,  

 

期刊: Applied Physics Letters  (AIP Available online 1976)
卷期: Volume 29, issue 9  

页码: 617-619

 

ISSN:0003-6951

 

年代: 1976

 

DOI:10.1063/1.89164

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Dominant hole conduction is observed in thin Si3N4films deposited on silicon with holes being injected from either aluminum or gold electrodes. Hole transport is confirmed by employing a shallow junction diode detector. Such a diode can serve also as excellent means for separating conduction currents from transient displacement currents under pulsed conditions.

 

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