Insitumonitoring of silicon nitride surface temperature from rotational temperature of a nitrogen molecule during rf glow discharge processing
作者:
Shin‐ichiro Ishihara,
Akira Otsuka,
Seiichi Nagata,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 23
页码: 2396-2398
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.102291
出版商: AIP
数据来源: AIP
摘要:
The rotational temperature of a nitrogen molecule (N2) was observed to increase proportionally with the substrate‐holder temperature in a capacitively coupled rf glow discharge system. The rotational temperature, equivalent to the gas temperature, from the second positive system of the emission spectrum of N2increased with increasing the mixing ratio of hydrogen, which correlates with the deposition rate, optical band gap, and etching rate of silicon nitride (SiNx). This technique can be used for monitoring the temperature of a SiNxsurface during glow discharge processing without any damage to the plasma.
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