Electron recombination rates at the gold acceptor level in high‐resistivity silicon
作者:
Luke Su Lu,
Chih‐Tang Sah,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 59,
issue 1
页码: 173-176
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.336857
出版商: AIP
数据来源: AIP
摘要:
Electron emission rates and capture cross sections at the gold acceptor level have been obtained in siliconp+/ndiodes with phosphorus concentrations of 1.2×1012cm−3and 5×1014cm−3, showing no phosphorus concentration dependencies. This indicates negligible electric field dependence of the electron emission rate in the range 102–105V/cm and supports the contention that the capture cross section is independent of the phosphorus dopant impurity concentration. The magnitude of the capture cross‐section data supports a neutral potential model of the gold acceptor center.
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