首页   按字顺浏览 期刊浏览 卷期浏览 Electron recombination rates at the gold acceptor level in high‐resistivity sili...
Electron recombination rates at the gold acceptor level in high‐resistivity silicon

 

作者: Luke Su Lu,   Chih‐Tang Sah,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 59, issue 1  

页码: 173-176

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.336857

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Electron emission rates and capture cross sections at the gold acceptor level have been obtained in siliconp+/ndiodes with phosphorus concentrations of 1.2×1012cm−3and 5×1014cm−3, showing no phosphorus concentration dependencies. This indicates negligible electric field dependence of the electron emission rate in the range 102–105V/cm and supports the contention that the capture cross section is independent of the phosphorus dopant impurity concentration. The magnitude of the capture cross‐section data supports a neutral potential model of the gold acceptor center.

 

点击下载:  PDF (306KB)



返 回