首页   按字顺浏览 期刊浏览 卷期浏览 States of copper during diffusion in semi‐insulating GaAs
States of copper during diffusion in semi‐insulating GaAs

 

作者: C. C. Tin,   C. K. Teh,   F. L. Weichman,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 63, issue 2  

页码: 355-359

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.341148

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photoinduced transient spectroscopy (PITS) and photoluminescence spectroscopy measurements were carried out on samples of liquid‐encapsulated Czochralski‐grown semi‐insulating GaAs which have been diffused with copper at 550 °C. The PITS curves, taken at different depths from the surface, confirm that the copper‐related acceptor level at 0.51 eV is due to a complex, which we assign to CuGaVAs. The PITS results show that an acceptor level at 0.51 eV in GaAs, previously assigned to iron impurity, can also be caused by copper. Photoluminescence studies show that the emission peak at 1.36 eV, commonly attributed to CuGa, also varies with depth. This variation is explained by the predominance of copper in the form Cu+inear the copper‐covered surface. We have shown, from both PITS and photoluminesence results, the significance of the capping effect of a copper film during annealing, and this effect must be taken into account in the analysis of copper diffusion data in GaAs.

 

点击下载:  PDF (597KB)



返 回