Reactive ion beam etching: Dissociation of molecular ions upon impact
作者:
Ch. Steinbrüchel,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1984)
卷期:
Volume 2,
issue 1
页码: 38-44
ISSN:0734-211X
年代: 1984
DOI:10.1116/1.582912
出版商: American Vacuum Society
关键词: chemical reaction yield;ion beams;etching;gold;thin films;ion sources;kev range 01−10;ev range 100−1000;mass spectra;molecular ions;dissociation;ion collisions;carbon fluorides;oxygen;argon;neon;experimental data;magnetic fields;Au;Si
数据来源: AIP
摘要:
This paper reports on etch yield measurements on Au films by ion beams generated from Ar, Ne, O2, N2, CF4, and C2F6in a Kaufman‐type ion gun for ion energies between 0.2 and 1.4 keV. Ions and neutral species emanating from the gun are characterized by mass spectrometry. For CF4and C2F6the ion composition is a strong function of the magnetic field in the gun, CF+3being the major ion only for CF4at low magnetic field. The physical etch yield of CF+3is found to be close to that of Ne+, not Ar+. The results on the dependence of the etch yields on ion mass, ion energy, and incident angle can be correlated quantitatively by assuming complete dissociation of molecular ions upon impact on the substrate. The same model is also shown to explain the data by Tachietal. on etching Si by mass‐selected ions of the form CF+xand BF+x. The implications of these results for plasma and reactive ion etching are discussed.
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