Impact of mixing of disturbed bonding states on time-dependent dielectric breakdown inSiO2thin films
作者:
J. W. McPherson,
H. C. Mogul,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 25
页码: 3721-3723
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120493
出版商: AIP
数据来源: AIP
摘要:
A temperature-independent field acceleration parameter &ggr; and a field-independent activation energy&Dgr;H0can be produced when different types of disturbed bonding states are mixed during time-dependent breakdown testing ofSiO2thin films. While &ggr; for each defect type alone has the expected1/Tdependence and&Dgr;H0shows a linear decrease with electric field, a nearly temperature-independent &ggr; and a field-independent&Dgr;H0can result when two or more states are mixed. ©1997 American Institute of Physics.
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