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Impact of mixing of disturbed bonding states on time-dependent dielectric breakdown inSiO2thin films

 

作者: J. W. McPherson,   H. C. Mogul,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 25  

页码: 3721-3723

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120493

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A temperature-independent field acceleration parameter &ggr; and a field-independent activation energy&Dgr;H0can be produced when different types of disturbed bonding states are mixed during time-dependent breakdown testing ofSiO2thin films. While &ggr; for each defect type alone has the expected1/Tdependence and&Dgr;H0shows a linear decrease with electric field, a nearly temperature-independent &ggr; and a field-independent&Dgr;H0can result when two or more states are mixed. ©1997 American Institute of Physics.

 

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